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Name:2019科研成果

1. D. Wang, G. He*, S. Liang, M. Liu, "Annealing-induced evolution in interface stability and electrical performance of sputtering-driven rare-earth-based gate oxides" J. Alloys. Comp. 778 (2019) 579-587.

2. J. Gao, G. He*, D. Wang, S. Liang, "Modulation of the interfacial and electrical properties of atomic-layer-deposited Hf0.5Al0.5O/Si gate stacks using Al2O3 passivation layer with various thickness" J. Vac. Sci. Technol. A 37(1) (2019) 011101-1-011101-8.

3. Y. F. Wang, X. Z. Wang, M. Zhang, L. L. Fang, L. P. Jin, J. Gao, Y. C. Zhang, B. Yang, G. He, Z. Q. Sun, "TiO2 nanorod array film decorated with rGO nanosheets for enhancing photocatalytic and photoelectrochemical properties" J. Alloys. Compd. 770 (2019) 243-251.

4. D. Wang, G. He*, L. Hao, J. Gao, and M. Zhang, "Comparative passivation effect of ALD-driven HfO2 and Al2O3 buffer layers on the interface chemistry and electrical characteristics of Dy-based gate dielectrics" J. Mater. Chem. C. 7 (2019) 1955-1965.

5. Y. F. Wang, M. Zhang, J. Li. H. C. Yang, J. Gao, G. He, and Z. Q. Sun, "Construction of Ag@AgCl decorated TiO2 nanorod array film with optimized photoelectrochemical and photocatalytic performance" Appl. Surf. Sci. 476 (2019) 84-93.

6. S. Liang, G. He*, D. Wang, F. Qiao, "Atomic-layer-deposited (ALD) Al2O3 passivation dependent interface chemistry, band alignment and electrical properties of HfYO/Si gate stacks" J. Mater. Sci. Technol. 35 (2019) 769-776.

7. M. Zhang, S. Wang, Z. L. Li, C. W. Liu, R. Miao, G. He, M. Zhao, J. Xue, Z. Y. Xia, Y. Q. Wang, Z. Q. Sun, and J. G. Lv, "Hydrothermal synthesis of MoS2 nanosheet loaded TiO2 nanoarrays for enhanced visible light photocatalytic application" RSC. Adv" RSC Adv. 9(6) (2019) 3479-3485.

8. B. Yang, G. He*, L. Zhu, C. Zhang, Y. C. Zhang, Y. F. Xia, F. Alam, Z. Q. Sun, "Low-Voltage-Operating Transistors and Logic Circuits Based on Water-Driven ZrGdOx Dielectric with Low Cost ZnSnO" ACS. Appl. Electro. Mater. 1 (2019) 625-636.

9. Y. Zuo, J. J. Chen, H. C. Yang, M. Zhang, Y. F. Wang, G. He, Z. Q. Sun, "Ag-Ag2S quantum-dots modified TiO2 nanorod arrays with enhanced photoelectrochemical and photocatalytic properties" J. Alloys. Compd. 780 (2019) 347-354.

10. H. C. Yang, J. J. Chen, Y. Zuo, M. Zhang, G. He, Z. Q. Sun, "Enhancement of photocatalytic and photoelectrochemical properties of BiOI nanosheets and silver quantum dots co-modified TiO2 nanorod arrays " J. Am. Ceram. Soc. 102(10) (2019) 5966-5975.

11. Y. F. Wang, M. Zhang, H. Yu, J. Gao, G. He, Z. Q. Sun, "Facile fabrication of Ag/graphene oxide/TiO2nanorod array as a powerful substrate for photocatalytic degradation and surface-enhanced Raman scattering detection" Appl. Catal. B: Environm. 252 (2019) 174-186.

12. S. Liang, G. He*, D. Wang, L. Hao, M. Zhang, J. B. Cui, "Modulating the Interface Chemistry and Electrical Properties of Sputtering-Driven HfYO/GaAs Gate Stacks by ALD Pulse Cycles and Thermal Treatment" ACS Omega. 4(7) (2019) 11663-11672.

13. B. Yang, G. He*, Y. C. Zhang, C. Zhang, Y. F. Xia, F. Alam, J. B. Cui, " Solution-Processed DyOx for Aging Diffusion ZnSnO Transistors and Application in Low-Voltage-Operating Logic Circuits" IEEE Trans. Electro. Devices. 66(8) (2019) 3479-3484.

14. C. Zhang, G. He*, B. Yang, Y. F. Xia, Y. C. Zhang, "Eco-Friendly Fully Water-Driven Metal-Oxide Thin Films and Their Applications in Transistors and Logic Circuits" IEEE Trans. Electro. Devices. 66(9) (2019) 3847-3853.

15. Y. F. Wang, M. Zhang, L. L. Fang, H. C. Yang, Y. Zuo, J. Gao, G. He, Z. Q. Sun, "A multifunctional Ag/TiO2/reduced graphene oxide with optimal surface-enhanced Raman scattering and photocatalysis" J. Am. Ceram. Soc. 102(7) (2019) 4000-4013.

16. Y. Zuo, J. J. Chen, H. C. Yang, M. Zhang, G. He, Z. Q. Sun, " Facile synthesis of TiO2/CdS ternary porous heterstructure arrays with enhanced photoelectrochemical and visible -light photocatalytic properties" J. Mater. Chem.C. 7(29) (2019) 9065-9074.

17. L. Zhu, G. He*, C. Zhang, B. Yang, Y. F. Xia, F. Alam, Y. C. Zhang, "Water-derived all-oxide thin film transistors with ZrAlOx gate dielectrics and exploration in digital circuits" IEEE Trans. Electro. Dev. 66(10) (2019) 4198-4204.

18. G. He*, D. Wang, R. Ma, M. Liu, J. B. Cui, "Interface chemistry and leakage current mechanism of HfGdON/Ge gate stack modulated by ALD-driven interlayer" RSC. Adv. 9 (2019) 33800-33805. 

19. Y. F. Wang, Y. Liu, L. Zhang, M. Zhang, G. He, and Z. Q. Sun, "Facile fabrication of a low adhesion, stable and superhydrophobic filter paper modified with ZnO microclusters" Appl. Surf. Sci. 496 (2019) 143743.

20. L. Hu, M. L. Zhao, S. Liang, D. P. Song, R. H. Wei, X. W. Tang, W. H. Song, J. M. Dai, G. He, C. J. Zhang, X. B. Zhu, Y. P. Sun, " Exploring high-performance p-type transparent conducting oxides based on electron correction in V2O5 thin films" Phys. Rev. Appl. 12 (2019) 044035. 











 
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