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科研成果
 
2006及以前科研成果
 
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科研成果
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Name:2006及以前科研成果

1. G. He*, Q. Fang, L. D. Zhang, “Silicate layer formation at HfO2/SiO2/Si interface determined by x-ray photoelectron spectroscopy and infrared spectroscopyJ. Appl. Phys. 100 (2006) 083517.
2. G. He*, Q. Fang, L. D. Zhang, “Structural and interfacial properties of HfOxNy gate dielectric films Mater. Sci. Semicond. Process. 9 (2006) 870.
3. M. Liu, Q. Fang, G. He, L. Li, L. Q. Zhu, G. H. Li, L. D. Zhang, “Effect of post deposition annealing on the optical properties of HfOxNy filmsAppl. Phys. Lett.  88 (2006) 192904.
4. L. Q. Zhu, L. D. Zhang, G. H. Li, G. He, M. Liu, Q. Fang, “Thermal stability and energy-band alignment of nitrogen-incorporated ZrO2 films on Si (100)Appl. Phys. Lett. 88 (2006) 232901.
5. M. Liu, G. He, L. Q. Zhu, Q. Fang, G. H. Li, L. D. Zhang, “Microstructure and interfacial properties of HfO2-Al2O3 composite films grown by sputteringAppl. Surf. Sci. 252 (2006) 6206.
6. M. Liu, Q. Fang, G. He, L. Q. Zhu, L. D. Zhang, “Characterization of HfOxNy gate dielectrics using a hafnium oxide as targetAppl. Surf. Sci. 252 (2006) 8673.
7. L. Q. Zhu, Q. Fang, G. He, M. Liu, L. D. Zhang, “Interfacial and optical properties of ZrO2/Si by reactive magnetron sputteringMater. Lett. 60 (2006) 288.
8. M. Liu, Q. Fang, G. He, L. Q. Zhu, S. S. Pan, L. D. Zhang, “Chemical compositions and optical properties of HfOxNy thin films at different substrate temperaturesMater. Sci. Semicond. Process. 9 (2006) 876.
9. L. Q. Zhu, Q. Fang, G. He, M. Liu, X. X. Xu, L. D. Zhang, “Spectroscopic ellipsometry characterization of ZrO2 thin films by nitrogen-assisted reactive magnetron sputtering”  Mater. Sci. Semicond. Process. 9 (2006) 1025.
10. L. Q. Zhu, G. He, M. Liu, L. D. Zhang, “Effect of annealing on optical properties and band alignments of ZrO2/Si (100) by nitrogen-assisted reactive sputteringJ. Phys. D: Appl. Phys. 39 (2006) 5285.
11. G. He*, L. D. Zhang, G. H. Li, M. Liu, L. Q. Zhu, S. S. Pan, Q. Fang, “Spectroscopic ellipsometry characterization of nitrogen-incorporated HfO2 gate dielectrics grown by radio-frequency reactive sputteringAppl. Phys. Lett. 86 (2005) 232901.
12. G. He*, J. X. Zhang, L. Q. Zhu, M. Liu, Q. Fang, L. D. Zhang, “Structural, interfacial and optical characterization of ultrathin Zirconia film grown by in-situ thermal oxidation of sputtered metallic Zr filmsNanotechnology. 16 (2005) 1641.
13. G. He*, M. Liu, L.Q. Zhu, M. Chang, Q. Fang, L.D. Zhang, “Effect of postdeposition annealing on the thermal stability and structural characteristics of sputtered HfO2 films on Si (100)” Surf.  Sci. 576 (2005) 67.
14. L. Q. Zhu, Q. Fang, G. He, M. Liu, L. D. Zhang, “Microstructure and optical properties of ultra thin Zirconia films prepared by nitrogen assisted reactive magnetron sputteringNanotech. 6 (2005) 2865.
15. X. S. Fang, C. H. Ye, G. He, Y. H. Wang, L. D. Zhang, “Synthesis and Characterization of Ultra-long Silica NanowiresAppl. Phys. A 80 (2005) 423.
16. G. He*, Q. Fang, L. Q. Zhu, M. Liu, L. D. Zhang, “The structure and thermal stability of TiO2 grown by the plasma oxidation of sputtered metallic Ti thin filmsChem. Phys. Lett. 395 (2004) 259.
17. G. He*, Q. Fang, M. Liu, L. Q. Zhu, L. D. Zhang, “The structural and interfacial properties of HfO2/Si by the plasma oxidation of sputtered metallic Hf thin filmsJ. Cryst. Growth. 268 (2004) 155.
18. Q. Fang, G. He, W. P. Cai, J. Y. Zhang, Ian W. Boyd “Palladium nanoparticles on silicon by Photo-reduction using 172nm excimer UV lampsAppl. Surf. Sci. 226 (2004) 7.
19. Q. Fang, J. Y. Zhang, Z. M. Wang, G. He, J. Yu, Ian W. Boyd, “High-k dielectrics by UV photo-assisted chemical vapour depositionMicroelec. Engineering. 66 (2003) 621.

 

 
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