1. G. He*, Q. Fang, L. D. Zhang, “Silicate layer formation at HfO2/SiO2/Si interface determined by x-ray photoelectron spectroscopy and infrared spectroscopy” J. Appl. Phys. 100 (2006) 083517.
2. G. He*, Q. Fang, L. D. Zhang, “Structural and interfacial properties of HfOxNy gate dielectric films” Mater. Sci. Semicond. Process. 9 (2006) 870.
3. M. Liu, Q. Fang, G. He, L. Li, L. Q. Zhu, G. H. Li, L. D. Zhang, “Effect of post deposition annealing on the optical properties of HfOxNy films” Appl. Phys. Lett. 88 (2006) 192904.
4. L. Q. Zhu, L. D. Zhang, G. H. Li, G. He, M. Liu, Q. Fang, “Thermal stability and energy-band alignment of nitrogen-incorporated ZrO2 films on Si (100)” Appl. Phys. Lett. 88 (2006) 232901.
5. M. Liu, G. He, L. Q. Zhu, Q. Fang, G. H. Li, L. D. Zhang, “Microstructure and interfacial properties of HfO2-Al2O3 composite films grown by sputtering” Appl. Surf. Sci. 252 (2006) 6206.
6. M. Liu, Q. Fang, G. He, L. Q. Zhu, L. D. Zhang, “Characterization of HfOxNy gate dielectrics using a hafnium oxide as target” Appl. Surf. Sci. 252 (2006) 8673.
7. L. Q. Zhu, Q. Fang, G. He, M. Liu, L. D. Zhang, “Interfacial and optical properties of ZrO2/Si by reactive magnetron sputtering” Mater. Lett. 60 (2006) 288.
8. M. Liu, Q. Fang, G. He, L. Q. Zhu, S. S. Pan, L. D. Zhang, “Chemical compositions and optical properties of HfOxNy thin films at different substrate temperatures” Mater. Sci. Semicond. Process. 9 (2006) 876.
9. L. Q. Zhu, Q. Fang, G. He, M. Liu, X. X. Xu, L. D. Zhang, “Spectroscopic ellipsometry characterization of ZrO2 thin films by nitrogen-assisted reactive magnetron sputtering” Mater. Sci. Semicond. Process. 9 (2006) 1025.
10. L. Q. Zhu, G. He, M. Liu, L. D. Zhang, “Effect of annealing on optical properties and band alignments of ZrO2/Si (100) by nitrogen-assisted reactive sputtering” J. Phys. D: Appl. Phys. 39 (2006) 5285.
11. G. He*, L. D. Zhang, G. H. Li, M. Liu, L. Q. Zhu, S. S. Pan, Q. Fang, “Spectroscopic ellipsometry characterization of nitrogen-incorporated HfO2 gate dielectrics grown by radio-frequency reactive sputtering” Appl. Phys. Lett. 86 (2005) 232901.
12. G. He*, J. X. Zhang, L. Q. Zhu, M. Liu, Q. Fang, L. D. Zhang, “Structural, interfacial and optical characterization of ultrathin Zirconia film grown by in-situ thermal oxidation of sputtered metallic Zr films” Nanotechnology. 16 (2005) 1641.
13. G. He*, M. Liu, L.Q. Zhu, M. Chang, Q. Fang, L.D. Zhang, “Effect of postdeposition annealing on the thermal stability and structural characteristics of sputtered HfO2 films on Si (100)” Surf. Sci. 576 (2005) 67.
14. L. Q. Zhu, Q. Fang, G. He, M. Liu, L. D. Zhang, “Microstructure and optical properties of ultra thin Zirconia films prepared by nitrogen assisted reactive magnetron sputtering” Nanotech. 6 (2005) 2865.
15. X. S. Fang, C. H. Ye, G. He, Y. H. Wang, L. D. Zhang, “Synthesis and Characterization of Ultra-long Silica Nanowires” Appl. Phys. A 80 (2005) 423.
16. G. He*, Q. Fang, L. Q. Zhu, M. Liu, L. D. Zhang, “The structure and thermal stability of TiO2 grown by the plasma oxidation of sputtered metallic Ti thin films” Chem. Phys. Lett. 395 (2004) 259.
17. G. He*, Q. Fang, M. Liu, L. Q. Zhu, L. D. Zhang, “The structural and interfacial properties of HfO2/Si by the plasma oxidation of sputtered metallic Hf thin films” J. Cryst. Growth. 268 (2004) 155.
18. Q. Fang, G. He, W. P. Cai, J. Y. Zhang, Ian W. Boyd “Palladium nanoparticles on silicon by Photo-reduction using 172nm excimer UV lamps” Appl. Surf. Sci. 226 (2004) 7.
19. Q. Fang, J. Y. Zhang, Z. M. Wang, G. He, J. Yu, Ian W. Boyd, “High-k dielectrics by UV photo-assisted chemical vapour deposition” Microelec. Engineering. 66 (2003) 621.
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