1. G. He*, Q. Fang, L. D. Zhang, “Silicate layer formation at HfO₂/SiO₂/Si interface determined by x-ray photoelectron spectroscopy and infrared spectroscopy” J. Appl. Phys. 100 (2006) 083517.
2. G. He*, Q. Fang, L. D. Zhang, “Structural and interfacial properties of HfO_xN_y gate dielectric films” Mater. Sci. Semicond. Process. 9 (2006) 870.
3. M. Liu, Q. Fang, G. He, L. Li, L. Q. Zhu, G. H. Li, L. D. Zhang, “Effect of post deposition annealing on the optical properties of HfO_xN_y films” Appl. Phys. Lett.  88 (2006) 192904.
4. L. Q. Zhu, L. D. Zhang, G. H. Li, G. He, M. Liu, Q. Fang, “Thermal stability and energy-band alignment of nitrogen-incorporated ZrO₂ films on Si (100)” Appl. Phys. Lett. 88 (2006) 232901.
5. M. Liu, G. He, L. Q. Zhu, Q. Fang, G. H. Li, L. D. Zhang, “Microstructure and interfacial properties of HfO₂-Al₂O₃ composite films grown by sputtering” Appl. Surf. Sci. 252 (2006) 6206.
6. M. Liu, Q. Fang, G. He, L. Q. Zhu, L. D. Zhang, “Characterization of HfO_xN_y gate dielectrics using a hafnium oxide as target” Appl. Surf. Sci. 252 (2006) 8673.
7. L. Q. Zhu, Q. Fang, G. He, M. Liu, L. D. Zhang, “Interfacial and optical properties of ZrO₂/Si by reactive magnetron sputtering” Mater. Lett. 60 (2006) 288.
8. M. Liu, Q. Fang, G. He, L. Q. Zhu, S. S. Pan, L. D. Zhang, “Chemical compositions and optical properties of HfO_xN_y thin films at different substrate temperatures” Mater. Sci. Semicond. Process. 9 (2006) 876.
9. L. Q. Zhu, Q. Fang, G. He, M. Liu, X. X. Xu, L. D. Zhang, “Spectroscopic ellipsometry characterization of ZrO₂ thin films by nitrogen-assisted reactive magnetron sputtering”  Mater. Sci. Semicond. Process. 9 (2006) 1025.
10. L. Q. Zhu, G. He, M. Liu, L. D. Zhang, “Effect of annealing on optical properties and band alignments of ZrO₂/Si (100) by nitrogen-assisted reactive sputtering” J. Phys. D: Appl. Phys. 39 (2006) 5285.
11. G. He*, L. D. Zhang, G. H. Li, M. Liu, L. Q. Zhu, S. S. Pan, Q. Fang, “Spectroscopic ellipsometry characterization of nitrogen-incorporated HfO₂ gate dielectrics grown by radio-frequency reactive sputtering” Appl. Phys. Lett. 86 (2005) 232901.
12. G. He*, J. X. Zhang, L. Q. Zhu, M. Liu, Q. Fang, L. D. Zhang, “Structural, interfacial and optical characterization of ultrathin Zirconia film grown by in-situ thermal oxidation of sputtered metallic Zr films” Nanotechnology. 16 (2005) 1641.
13. G. He*, M. Liu, L.Q. Zhu, M. Chang, Q. Fang, L.D. Zhang, “Effect of postdeposition annealing on the thermal stability and structural characteristics of sputtered HfO₂ films on Si (100)” Surf.  Sci. 576 (2005) 67.
14. L. Q. Zhu, Q. Fang, G. He, M. Liu, L. D. Zhang, “Microstructure and optical properties of ultra thin Zirconia films prepared by nitrogen assisted reactive magnetron sputtering” Nanotech. 6 (2005) 2865.
15. X. S. Fang, C. H. Ye, G. He, Y. H. Wang, L. D. Zhang, “Synthesis and Characterization of Ultra-long Silica Nanowires” Appl. Phys. A 80 (2005) 423.
16. G. He*, Q. Fang, L. Q. Zhu, M. Liu, L. D. Zhang, “The structure and thermal stability of TiO₂ grown by the plasma oxidation of sputtered metallic Ti thin films” Chem. Phys. Lett. 395 (2004) 259.
17. G. He*, Q. Fang, M. Liu, L. Q. Zhu, L. D. Zhang, “The structural and interfacial properties of HfO₂/Si by the plasma oxidation of sputtered metallic Hf thin films” J. Cryst. Growth. 268 (2004) 155.
18. Q. Fang, G. He, W. P. Cai, J. Y. Zhang, Ian W. Boyd “Palladium nanoparticles on silicon by Photo-reduction using 172nm excimer UV lamps” Appl. Surf. Sci. 226 (2004) 7.
19. Q. Fang, J. Y. Zhang, Z. M. Wang, G. He, J. Yu, Ian W. Boyd, “High-k dielectrics by UV photo-assisted chemical vapour deposition” Microelec. Engineering. 66 (2003) 621.